Publication

T. Siefke, M. Heusinger, C.B.R. Hurtado, J. Dickmann, U. Zeitner, A. Tünnermann, S. Kroker, Line-edge roughness as a challenge for high-performance wire grid polarizers in the far ultraviolet and beyond, Optics Express 26 (15), 19534-19547 (2018). http://dx.doi.org/10.1364/OE.26.019534External link

M. Heusinger, D. Michaelis, T. Flügel-Paul, U.D. Zeitner, Diffuse scattering due to stochastic disturbances of 1D-gratings on the example of line edge roughness, Optics Express 26 (21), 28104-28118 (2018). http://dx.doi.org/10.1364/OE.26.028104External link

M. Heusinger, M. Banasch, U.D. Zeitner, Rowland ghost suppression in high efficiency spectrometer gratings fabricated by e-beam lithography, Optics Express 25 (6), 6182-6190 (2017). http://dx.doi.org/10.1364/OE.25.006182External link

T. Weichelt, Y. Bourgin, U.D. Zeitner, Mask aligner lithography using laser illumination for versatile pattern generation, Optics Express 25 (18), 20983-20992 (2017). http://dx.doi.org/10.1364/OE.25.020983External link

G. Kalkowski, K. Grabowski, G. Harnisch, T. Flugel-Paul, U. Zeitner, S. Risse, Fused silica GRISMs manufactured by hydrophilic direct bonding at moderate heating, Ceas Space Journal 9 (4), 433-440 (2017). http://dx.doi.org/10.1007/s12567-017-0158-4External link

C. Liu, C. Straif, T. Flügel-Paul, U.D. Zeitner, H. Gross, Comparison of hyperspectral imaging spectrometer designs and the improvement of system performance with freeform surfaces, Applied Optics 56 (24), 6894-6901 (2017). http://dx.doi.org/10.1364/AO.56.006894External link

Y. Bourgin, D. Voigt, T. Käsebier, T. Siefke, E.-B. Kley, U. D. Zeitner, 175 nm period grating fabricated by i-line proximity mask-aligner lithography, Optics Letters 42 (19), 3816-3819 (2017). https://doi.org/10.1364/OL.42.003816External link

C. Reinlein, C. Damm, N. Lange, A. Kamm, M. Mohaupt, A. Brady, M. Goy, N. Leonhard, R. Eberhardt, U. Zeitner, A. Tünnermann, Temporally-stable active precision mount for large optics, Optics Express 24 (12), 13527-13541 (2016). http://dx.doi.org/10.1364/OE.24.013527External link

T. Weichelt, R. Kinder, U.D. Zeitner, Photomask displacement technology for continuous profile generation by Mask Aligner Lithography, Journal of Optics 18 (12), 125401 (2016). http://dx.doi.org/10.1088/2040-8978/18/12/125401External link

L. Stürzebecher, F. Fuchs, T. Harzendorf, U.D. Zeitner, Pulse compression grating fabrication by diffractive proximity photolithography, Optics Letters 39 (4), 1042 - 1045 (2014). http://dx.doi.org/10.1364/OL.39.001042External link

O. Stenzel, S. Wilbrandt, X. Chen, R. Schlegel, L. Coriand, A. Duparré, U. Zeitner, T. Benkenstein, C. Wächter, Observation of the waveguide resonance in a periodically patterned high refractive index broadband antireflection coating, Applied Optics 53 (14), 3147-3156 (2014). http://dx.doi.org/10.1364/AO.53.003147External link

D. Stumpf, U.D. Zeitner, Extending standard mask lithography exposure technique to spherical surfaces, Applied Physics B-Lasers and Optics 115 (3), 371-377 (2014). http://link.springer.com/article/10.1007%2Fs00340-013-5612-1External link

Y. Bourgin, T. Käsebier, U. D. Zeitner, 250nm period grating transferred by proximity i-line mask-aligner lithography., Optics Letters 39 (6), 1665-8 (2014). http://dx.doi.org/10.1364/OL.39.001665External link

F. Stutzki, C. Gaida, M. Gebhardt, F. Jansen, A. Wienke, U. Zeitner, F. Fuchs, C. Jauregui, D. Wandt, D. Kracht, J. Limpert, A. Tünnermann, 152 W average power Tm-doped fiber CPA system, Optics Letters 39 (16), 4671-4674 (2014). http://dx.doi.org/10.1364/OL.39.004671External link

M. Trost, S. Schröder, A. Duparre, S. Risse, T. Feigl, U. D. Zeitner, A. Tünnermann, Structured Mo/Si multilayers for IR-suppression in laser-produced EUV light sources, Optics Express 21 (23), 27852-27864 (2013). http://dx.doi.org/10.1364/OE.21.027852External link

H. C. Eckstein, U. D. Zeitner, Modeling electro-optical characteristics of broad area semiconductor lasers based on a quasi-stationary multimode analysis, Optics Express 21 (20), 23231-23240 (2013). http://dx.doi.org/10.1364/OE.21.023231External link

M. Oliva, D. Michaelis, F. Fuchs, A. Tünnermann, U. D. Zeitner, Highly efficient broadband blazed grating in resonance domain, Applied Physics Letters 102 (20), 203114 (2013). http://dx.doi.org/10.1063/1.4807764External link

G. Kalkowski, T. Benkenstein, C. Rothhardt, F. Fuchs, U. D. Zeitner, Direct bonding for the encapsulation of transverse optical gratings, Microelectronic Engineering 110, 302-306 (2013). http://dx.doi.org/10.1016/j.mee.2013.02.031External link

Y. Jourlin, S. Tonchev, O. Parriaux, J. Sauvage-Vincent, T. Harzendorf, U. Zeitner, Waveguide Grating Radial Polarizer for the Photolithography of Circularly Symmetrical Optical Elements, IEEE Photonics Journal 4, 1728-1736 (2012). 10.1109/JPHOT.2012.2213336

M. Oliva, D. Michaelis, P. Dannberg, M. Jozwik, K. Lizewski, M. Kujawinska, U.D. Zeitner, Twyman-Green-type integrated laser interferometer array for parallel MEMS testing, Journal of MicroEngineering and MicroEngineering 22, 015018 (2012). http://dx.doi.org/10.1088/0960-1317/22/1/015018External link

F. Burmeister, S. Steenhusen, R. Houbertz, U. D. Zeitner, S. Nolte, A. Tünnermann, Materials and technologies for fabrication of three-dimensional microstructures with sub-100 nm feature sizes by two-photon polymerization, Journal of Laser Applications 24(4), 042014 (2012). http://dx.doi.org/10.2351/1.4730807External link

U.D. Zeitner, M. Oliva, F. Fuchs, D. Michaelis, T. Benkenstein, T. Harzendorf, E.-B. Kley, High-performance diffraction gratings made by e-beam lithography, Applied Physics A-Materials Science & Processing 109 (4), 789-796 (2012). http://dx.doi.org/10.1007/s00339-012-7346-zExternal link

G. Kalkowski, U. Zeitner, T. Benkenstein, J. Fuchs, C. Rothhardt, R. Eberhardt, Direct wafer bonding for encapsulation of fused silica optical gratings, Microelectronic Engineering 97, 177-180 (2012). http://dx.doi.org/10.1016/j.mee.2012.04.020External link

M. Oliva, T. Harzendorf, D. Michaelis, U. D. Zeitner, A. Tünnermann, Multilevel blazed gratings in resonance domain: an alternative to the classical fabrication approach, Optics Express 19 (15), 14735-14745 (2011). http://dx.doi.org/10.1364/OE.19.014735External link

R. Voelkel, U. Vogler, A. Bich, P. Pernet, K.J. Weible, M. Hornung, R. Zoberbier, E. Cullmann, L. Stürzebecher, T. Harzendorf, U.D. Zeitner, Advanced Mask Aligner Lithography: New Illumination System, Optics Express 18, 20968-20978 (2010). http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-18-20-20968External link

L. Stürzebecher, T. Harzendorf, U. Vogler, U.D. Zeitner, R. Voelkel, Advanced mask aligner lithography: fabrication of periodic patterns using pinhole array mask and Talbot effect, Optics Express 18, 19485-19494 (2010). http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-18-19-19485External link

U. D. Zeitner, M. Banasch, E.-B. Kley, The making of a computer-generated hologram, Photonics Spectra 42 (12), 58-61 (2008). http://www.photonics.com/Article.aspx?AID=35973External link

J. Thomas, E. Wikszak, T. Clausnitzer, U. Fuchs, U. Zeitner, S. Nolte, A. Tünnermann, Inscription of fiber Bragg gratings with femtosecond pulses using a phase mask scanning technique, Applied Physics A-Materials Science & Processing 86 (2), 153-157 (2007). http://dx.doi.org/10.1007/s00339-006-3754-2External link

U. Fuchs, U. Zeitner, A. Tünnermann, Hybrid optics for focusing ultrashort laser pulses, Optics Letters 31 (10), 1516-1518 (2006). http://dx.doi.org/10.1364/OL.31.001516External link

U. Fuchs, U. Zeitner, A. Tünnermann, Ultra-short pulse propagation in complex optical systems, Optics Express 13 (10), 3852-3861 (2005). http://dx.doi.org/10.1364/OPEX.13.003852External link

J. Ruske, B. Zeitner, A. Tünnermann, A. Rasch, Photorefractive effect and high power transmission in LiNbO3 channel waveguides, Comptes Rendus Physique 39 (14), 1048-1050 (2003). http://dx.doi.org/10.1049/el:20030703External link

E. Werner, J. Ruske, B. Zeitner, W. Biehlig, A. Tünnermann, Integrated-optical amplitude modulator for high power applications, Optics Communications 221 (1-3), 9-12 (2003). http://dx.doi.org/10.1016/S0030-4018(03)01460-3

J. Ruske, E. Werner, B. Zeitner, A. Tünnermann, Integrated optical ultrashort-pulse picker with high extinction ratio, Comptes Rendus Physique 39 (20), 1442-1443 (2003). http://dx.doi.org/10.1049/el:20030959External link

U. Grusemann, B. Zeitner, M. Rottschalk, J. Ruske, A. Tünnermann, A. Rasch, Integrated-optical wavelength sensor with self-compensation of thermally induced phase shifts by use of a LiNbO3 unbalanced Mach-Zehnder interferometer, Applied Optics 41 (29), 6211-6219 (2002). http://dx.doi.org/10.1364/AO.41.006211

 

U. Zeitner, B. Schnabel, E. Kley, F. Wyrowski, Polarization multiplexing of diffractive elements with metal-stripe grating pixels, Applied Optics 38 (11), 2177-2181 (1999). http://dx.doi.org/10.1364/AO.38.002177External link

U. Zeitner, F. Wyrowski, High modal discrimination for laser resonators with Gaussian output beam, Journal of Modern Optics 46 (9), 1309-1314 (1999). http://dx.doi.org/10.1080/09500349908231337External link

E.-B. Kley, L.-C. Wittig, M. Cumme, U.D. Zeitner, P. Dannberg, Fabrication and properties of refractive micro-optical beam-shaping elements, Proc. SPIE 3879 (20) (1999). http://dx.doi.org/10.1117/12.360513External link

U. Zeitner, H. Aagedal, F. Wyrowski, Comparison of resonator-originated and external beam shaping, Applied Optics 38 (6), 980-986 (1999). http://dx.doi.org/10.1364/AO.38.000980External link