Publications

DOI:

10.1016/j.apsusc.2026.166007External link

University Bibliography Jena:

fsu_mods_00030054External link

DOI:

10.1016/j.vacuum.2025.114781External link

University Bibliography Jena:

fsu_mods_00028385External link

In this paper, we discuss several enhancement approaches to increase the resolution and sensitivity of optical microscopy as a tool for dimensional nanometrology. Firstly, we discuss a newly developed through-focus microscopy technique providing additional phase information from the afocal images to increase the nanoscale sensitivity of classical microscopy. We also explore different routes to label-free or semiconductor compatible labelling super-resolution microscopy suitable for a broad range of technical applications. We present initial results from, a new wide-field super-resolution imaging technique enabled by Raman scattering. In addition, we discuss super-resolution imaging using NV centres in nano-diamonds as labels and their application in future reference standards.

DOI:

10.1051/jeos/2025002External link

University Bibliography Jena:

fsu_mods_00029549External link

DOI:

10.1088/1681-7575/adbbf3External link

University Bibliography Jena:

fsu_mods_00022580External link

DOI:

10.1088/1361-6528/add89aExternal link

University Bibliography Jena:

fsu_mods_00025176External link

Gold gratings were measured by spectroscopic ellipsometry in reflection mode and modeled by the finite element method to investigate the capabilities of optical dimensional metrology for plasmonic diffractive structures. The gratings were prepared by electron beam lithography using parameters determined by finite element simulations for significant variations of the amplitude ratio and phase shift of the polarized reflection coefficients to achieve high sensitivity for both the measurement of the grating dimensions and the sensing capabilities. The sensitivity largely depends on the values in the five-dimensional parameter space including the grating parameters such as the critical dimension, the period, and the thickness of the grating, as well as the measurement parameters comprising the wavelength and the angle of incidence. The best limit of detection values are in the picometer range for the critical dimension and the thickness of the overlayer, and ≈10⁻⁵ for the refractive index.

DOI:

10.1021/acsomega.5c00951External link

University Bibliography Jena:

fsu_mods_00024130External link

Hafnium oxide (HfO₂) is of increasing interest in both microelectronics and photonics due to its favorable optical and dielectric properties. In particular, its high refractive index, wide bandgap, and chemical stability render it attractive for optical coatings and metasurfaces down to the ultraviolet spectral range. Atomic layer deposition (ALD) has been commonly employed to produce high-quality HfO₂ films. In this contribution we are reporting on the measured refractive index from a wavelength of 120 nm to 600 nm.

DOI:

10.1051/epjconf/202533508003External link

University Bibliography Jena:

fsu_mods_00028507External link

Metasurfaces enable precise light manipulation, like fostering reflections close to unity, through resonance mechanisms. While traditional Bragg mirrors enable very high reflectivity they limit the achievable thermal noise. Meta-material-mirrors (MMM) can overcome the noise limitations but suffer from limited reflectivity. This trade-off is crucial for next-generation cryogenic gravitational wave detectors, such as the Einstein Telescope, which need high reflectivity and low thermal noise test mass coatings to achieve dramatic sensitivity. Hence, we are proposing a new combined design unifying the advantages from both approaches-composed of an MMM, a Fabry- Pérot spacer, and a Bragg mirror-achieving extremely high reflectance and low thermal noise. We are evaluating different 1D and 2D design approaches to achieve MMM robust to fabrication tolerances while offering broad, high reflection at 1550 nm. A key focus is on bandwidth, manufacturability, and thermal noise. This systematic analysis provides a pathway to promising MMM for production via e.g. character projection electron beam lithography, paving the way for high-performance mirrors in gravitational wave astronomy and beyond.

DOI:

10.1051/epjconf/202533505015External link

University Bibliography Jena:

fsu_mods_00028506External link

DOI:

10.1117/12.3055797External link

University Bibliography Jena:

fsu_mods_00026647External link

To accurately achieve structure height differences in the range of single digit nanometres is of great importance for the fabrication of diffraction gratings for the extreme ultraviolet range (EUV). Here, structuring of silicon irradiated through a mask by a broad beam of helium ions with an energy of 30 keV was investigated as an alternative to conventional etching, which offers only limited controllability for shallow structures due to the higher rate of material removal. Utilising a broad ion beam allows for quick and cost effective fabrication. Ion fluence of the irradiations was varied in the range of 10¹⁶ ... 10¹⁷ ions · cm⁻². This enabled a fine tuning of structure height in the range of 1.00 ± 0.05 to 20 ± 1 nm, which is suitable for shallow gratings used in EUV applications. According to transmission electron microscopy investigations the observed structure shape is attributed to the formation of point defects and bubbles/cavities within the silicon. Diffraction capabilities of fabricated elements are experimentally shown at the SX700 beamline of BESSY II. Rigorous Maxwell solver simulation based on the finite-element method and rigorous coupled wave analysis are utilised to describe the experimental obtained diffraction pattern.

DOI:

10.1088/1361-6528/adc4ecExternal link

University Bibliography Jena:

fsu_mods_00023928External link

DOI:

10.1117/12.3061518External link

University Bibliography Jena:

fsu_mods_00029436External link

DOI:

10.1063/5.0289040External link

University Bibliography Jena:

fsu_mods_00029381External link