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Dr. Adriana Szeghalmi, Habilitandin am Institut für Angewandte Physik Friedrich-Schiller-Universität Jena
Atomic Layer Deposition Materials for Optical Applications
Veranstaltungsart: Physikalisches Kolloquium - Habilitationsvorstellungsvortrag
Zeit: 20.11.2017, 16:15 - 17:30 Uhr
Ort: HS 1 Abbeanum, Fröbelstieg 1
Veranstalter: Physikalisch-Astronomische Fakultät


Max-Wien-Platz 1

07743 Jena

Tel. 03641 9-47001


Atomic Layer Deposition Materials for Optical Applications
The goal of our Emmy Noether research group is the development of materials by atomic layer deposition for optical applications. Atomic layer deposition is a powerful coating technology for conformal coatings on strongly curved substrates and on nanostructured components.
We have studied the morphology, optical, mechanical properties of several oxides with low and high refractive indices including SiO2, Al2O3, HfO2 and TiO2 and metals iridium and ruthenium. The material properties could be improved by applying plasma enhanced atomic layer deposition. Material development based on the unique capability of ALD to control the composition at sub-Angstrom level allowed us to realize nanoporous SiO2 thin films with controlled porosity and refractive index. These materials are being applied in various optical components.

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